Investigation of changes in the paramets of thin films structures during ion implantationAbstract
In this paper were investigated the change of parameters of structures of thin film during ion implantation. Thickness of thin films before and after ion implantation were investigated by X-ray reflectivity. Also, crystal structure, average crystallite size and lattice constant were investigated by X-ray diffraction. The possibility of using ion implantation technique as method of changing grains size in structures was demonstrated.